In a groundbreaking development, a team of researchers at the Chinese Academy of Sciences has achieved the highest power output for 193 and 221 nm lasers using a lithium tri borate (LBO) crystal. This breakthrough opens up new possibilities for utilizing this laser in the deep ultraviolet (DUV) spectrum.
The DUV spectrum is already widely used in various fields of science and technology, including defect inspection, spectroscopy, lithography, and metrology. Traditionally, the ArgonFluoride (ArF) laser has been the go-to choice for generating high-power 193 nm lasers needed for lithography applications.
However, with this new achievement by the Chinese researchers, the potential applications of the 193 and 221 nm lasers using the LBO crystal have expanded. This advancement could lead to improved performance and efficiency in existing DUV applications, as well as enable the development of new technologies that benefit from the higher power output.
The researchers’ work paves the way for further innovation in the field of DUV lasers. With more powerful and efficient tools available to scientists and engineers, we can expect to see even more exciting discoveries and innovations emerge from this field in years to come.
